An adversarial review of the justification commit found a SEVERE bug: stems detach from their noteheads (~0.75 ss, up to ~1.5) in every justified system. Root cause: the code used is_rigid_width_stroke to select slot-anchored strokes on the false premise it covered stems. It is LEDGER-ONLY. A stem is an Event-sourced stroke drawn at notehead_x + 1.15 with no same-source glyph (noteheads are Pitch-sourced) and no baseline in its x-span, so it fell to the affine branch and its intra-slot offset was scaled by the justification factor a, floating it off its head into the gap. The spacing pass shared the same classification (a smaller latent drift). Fix: component_glyph classifies a stroke — a Staff (staff line) or RepeatStructure (volta bracket, whose ending-number glyphs share its source) source SPANS (affine); else owning_glyph (a ledger over its notehead, same Pitch source); else the glyph with the greatest baseline <= the stroke's x — a stem's own in-column notehead (stem_offset 1.15 < column step 1.6, so exactly its slot). Applied in BOTH the spacing remap and casting, so stems ride their heads through the whole pipeline. Ledgers are unchanged (owning_glyph path). Regression: stem_offsets_from_the_notehead_survive_justification (verified to fail without the fix). Goldens regenerated (stems now on their heads). The minor slur-inset drift (same root cause, ~0.3 ss on a soft connector) is deferred with a note. Folded into ENGRAVER_VERSION 8 (unreleased). 941 tests, clippy 0, docs -D warnings, conformance 8/8. Co-Authored-By: Claude Opus 4.8 (1M context) <noreply@anthropic.com> |
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| src | ||
| Cargo.toml | ||
| DECISIONS.md | ||
| README.md | ||
README.md
epiphany-engrave
Agent I's engraving constraint solver (spec Chapter 9): turns a
ConstrainedLayoutIR into a ResolvedLayoutIR with real geometry. It is the
production-side replacement for epiphany-layout-ir's interface-only
StubSolver; the two live in separate crates so the spec's core/product boundary
stays sharp.
Status: Minimal tier, with casting-off
Engraverruns a deterministic horizontal spacing pass (the first axis of the two-pass spring layout): each spring slot is placed left-to-right by a collision-aware advance derived from real glyph bearings.- A casting-off pass (Phase 3's layout track) then breaks the spaced line
into systems at measure boundaries (greedy first-fit against a
PageGeometry— default A4 portrait at an 8 mm staff), stacks systems vertically at the vertical-band model's inter-system gap, assigns pages by content height, and populates the realResolvedPage/ResolvedSystemtree. Every position is baked into a single y-up world frame (pages stacked vertically), so the SVG renderer and hit-testing consume the flat glyph/stroke lists unchanged. - The IR's declared constraints are evaluated — geometric families against
the pre-casting spaced frame, break constraints against the final break
structure (hard breaks are always honoured; a pathological soft break is
skipped and recorded as an
IrOverridedecision). Chosen breaks are recorded asEngravingDecisions withSynthesisKind::EngravedBreaktargets, attributed to the user override that requested them when one did. - It reports
SolverTier::Minimal: hard constraints (break family included) satisfied, no optimality claim — the quality-metric vector stays the honest all-worst placeholder until the Quality Metric Catalog lands.
Deferred: the vertical soft-spring solve, per-system justification/stretch,
optimal break search, widow/orphan control, and casting-off caching. See
DECISIONS.md.
use epiphany_engrave::Engraver;
use epiphany_layout_ir::{ConstraintSolver, SolverConfig};
let report = Engraver::default().solve(&constrained_ir, &SolverConfig::default());
assert!(report.satisfied_hard_constraints);
let resolved = report.layout; // real pages/systems; hand to epiphany-render-svg